High-Pressure high-temperature annealing of ion-implanted GaN films monitored by visible and ultraviolet Micro-Raman scattering

Citation

Kuball, M, Hayes, J, Suski, T et al 2000, 'High-Pressure high-temperature annealing of ion-implanted GaN films monitored by visible and ultraviolet Micro-Raman scattering', Journal of Applied Physics, vol. 87, pp. 2736-2741.

Year

2000

Field of Research

  • Plasma Physics; Fusion Plasmas; Electrical Discharges

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