Vacancy and Interstitial Depth Profiles in Ion-implanted Silicon

Citation

Leveque, P, Kortegaard-Nielsen, H, Pellegrino, P et al 2003, 'Vacancy and Interstitial Depth Profiles in Ion-implanted Silicon', Journal of Applied Physics, vol. 93, no. 2, pp. 871-877.

Year

2003

Field of Research

  • Electrical And Electronic Engineering Not Elsewhere Classified

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