Suppression of Interdiffusion in InGaAs/GaAs Quantum Dots using Dielectric Layer of Titanium Dioxide

Citation

Fu, L, McGowan, P, Tan, H et al 2003, 'Suppression of Interdiffusion in InGaAs/GaAs Quantum Dots using Dielectric Layer of Titanium Dioxide', Applied Physics Letters, vol. 82, no. 16, pp. 2613-2615.

Year

2003

Fields of Research

  • Nanotechnology Not Elsewhere Classified
  • Materials Engineering Not Elsewhere Classified
  • Classical And Physical Optics

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