Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation
Citation
Li, W, Bulla, D, Love, J et al. 2003, 'Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation', Journal of Vacuum Science and Technology A, vol. 21, no. 3, pp. 792-796.Year
2003Field of Research
- Classical And Physical Optics