Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation

Citation

Li, W, Bulla, D, Love, J et al 2003, 'Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation', Journal of Vacuum Science and Technology A, vol. 21, no. 3, pp. 792-796.

Year

2003

Field of Research

  • Classical And Physical Optics

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