Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation

Citation

Li, W, Bulla, D, Love, J et al. 2003, 'Hydrogen Contamination in Ge-doped SiO2 Thin Films Prepared by Helicon Activated Reactive Evaporation', Journal of Vacuum Science and Technology A, vol. 21, no. 3, pp. 792-796.

Year

2003

ANU Authors

Field of Research

  • Classical And Physical Optics

Updated:  27 July 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers