Dry etching characteristics... - Researchers

Dry etching characteristics of amorphous As2S3 film in CHF3 plasma

Citation

Choi, D, Madden, S, Rode, A et al. 2008, 'Dry etching characteristics of amorphous As2S3 film in CHF3 plasma', Journal of Applied Physics, vol. 104, no. 11, p. 113305.

Year

2008

ANU Authors

Associate Professor Duk Choi
Professor Stephen Madden
Emeritus Professor Andrei Rode
Professor Barry Luther-Davies

Field of Research

Photonics, Optoelectronics And Optical Communications

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