Dry etching characteristics of amorphous As2S3 film in CHF3 plasma

Citation

Choi, D, Madden, S, Rode, A et al 2008, 'Dry etching characteristics of amorphous As2S3 film in CHF3 plasma', Journal of Applied Physics, vol. 104, no. 11, p. 113305.

Year

2008

Field of Research

  • Photonics, Optoelectronics And Optical Communications

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