Nanoscale phase separation in ultrafast pulsed laser deposited arsenic trisulfide (As2S3) films and its effect on plasma etching

Citation

Choi, D, Madden, S, Rode, A et al 2007, 'Nanoscale phase separation in ultrafast pulsed laser deposited arsenic trisulfide (As2S3) films and its effect on plasma etching', Journal of Applied Physics, vol. 102, pp. 083532 1-5.

Year

2007

Fields of Research

  • Nanotechnology Not Elsewhere Classified
  • Surfaces And Structural Properties Of Condensed Matter

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