Interface creation and stress dynamics in plasma-deposited silicon dioxide films

Citation

Au, V, Charles, C & Boswell, R 2006, 'Interface creation and stress dynamics in plasma-deposited silicon dioxide films', Applied Physics Letters, vol. 88, no. 23, pp. 234103-1-3.

Year

2006

Field of Research

  • Plasma Physics; Fusion Plasmas; Electrical Discharges

Updated:  14 June 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers