Thickness-dependent Stress ... - Researchers

Thickness-dependent Stress in Plasma-deposited Silicon Dioxide Films

Citation

Au, V, Charles, C, Bulla, D et al 2005, 'Thickness-dependent Stress in Plasma-deposited Silicon Dioxide Films', Journal of Applied Physics, vol. 97, no. 8, pp. 084912-1-7.

Year

2005

ANU Authors

Professor Christine Charles
Professor Roderick Boswell

Field of Research

Surfaces And Structural Properties Of Condensed Matter

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