Impurity free intermixing of GaAs/AlGaAs quantum wells using SiOx capping: Effect of nitrous oxide flow rate

Citation

Deenapanray, P & Jagadish, C 2001, 'Impurity free intermixing of GaAs/AlGaAs quantum wells using SiOx capping: Effect of nitrous oxide flow rate', Journal of Vacuum Science and Technology B, vol. 19, no. 5, pp. 1962-1966.

Year

2001

ANU Authors

Field of Research

  • Plasma Physics; Fusion Plasmas; Electrical Discharges

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