A protective layer on As2S3 film for photo-resist patterning

Citation

Choi, D, Madden, S, Rode, A et al 2008, 'A protective layer on As2S3 film for photo-resist patterning', Journal of Non-crystalline Solids, vol. 354, no. 2008, pp. 5253 - 5254.

Year

2008

Fields of Research

  • Photonics, Optoelectronics And Optical Communications
  • Condensed Matter Characterisation Technique Development
  • Surfaces And Structural Properties Of Condensed Matter

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