Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement

Citation

Choi, D, Madden, S, Rode, A et al 2008, 'Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement', IEEE Transactions on Nanotechnology, vol. 7, no. 3, pp. 285-290.

Year

2008

Fields of Research

  • Surfaces And Structural Properties Of Condensed Matter
  • Photonics, Optoelectronics And Optical Communications

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