Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement
Citation
Choi, D, Madden, S, Rode, A et al. 2008, 'Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement', IEEE Transactions on Nanotechnology, vol. 7, no. 3, pp. 285-290.Year
2008ANU Authors
Fields of Research
- Surfaces And Structural Properties Of Condensed Matter
- Photonics, Optoelectronics And Optical Communications