Comparison of stress in sin... - Researchers

Comparison of stress in single and multiple layer depositions of plasma-deposited amorphous silicon dioxide

Citation

Au, V, Charles, C & Boswell, R 2006, 'Comparison of stress in single and multiple layer depositions of plasma-deposited amorphous silicon dioxide', Journal of Physics D: Applied Physics, vol. 39, pp. 164-171.

Year

2006

ANU Authors

Professor Christine Charles
Professor Roderick Boswell

Field of Research

Plasma Physics; Fusion Plasmas; Electrical Discharges

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