A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices

Citation

Vos, M, Grande, P, Nandi, S et al 2013, 'A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices', Journal of Applied Physics, vol. 114, no. 7, pp. 073508/ 1-7.

Year

2013

Field of Research

  • Condensed Matter Physics Not Elsewhere Classified

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