A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices
Citation
Vos, M, Grande, P, Nandi, S et al. 2013, 'A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices', Journal of Applied Physics, vol. 114, no. 7, pp. 073508/ 1-7.Year
2013Field of Research
- Condensed Matter Physics Not Elsewhere Classified
