Activation energy and blistering rate in hydrogen-implanted semiconductors

Citation

Pyke, D, Elliman, R & McCallum, J 2012, 'Activation energy and blistering rate in hydrogen-implanted semiconductors', Mat. Res. Soc. Sym. Proc. 1424, pp79-84.

Year

2012

ANU Authors

Fields of Research

  • Microelectronics And Integrated Circuits
  • Functional Materials
  • Nanofabrication, Growth And Self Assembly

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