Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films

Citation

Venkatachalam, D, Bradby, J, Nawaz, M et al 2011, 'Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films', Journal of Applied Physics, vol. 110, no. 4, p. 043527.

Year

2011

Field of Research

  • Surfaces And Structural Properties Of Condensed Matter

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