Accurate measurement of the formation rate of iron-boron pairs in silicon

Citation

Tan, J, MacDonald, D, Rougieux, F et al 2011, 'Accurate measurement of the formation rate of iron-boron pairs in silicon', Semiconductor Science and Technology, vol. 26, no. 5, pp. 1-5.

Year

2011

Field of Research

  • Compound Semiconductors

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