Effect of Phosphorus Diffusion to the Recombination at the Si-SiO2 Interface
Citation
Jin, H, Weber, K & Zhang, C 2009, 'Effect of Phosphorus Diffusion to the Recombination at the Si-SiO2 Interface', Progress in Photovoltaics: Research and Applications, vol. 17, no. 3, pp. 177-181.Year
2009ANU Authors
Field of Research
- Electrical And Electronic Engineering Not Elsewhere Classified