Effect of Phosphorus Diffusion to the Recombination at the Si-SiO2 Interface

Citation

Jin, H, Weber, K & Zhang, C 2009, 'Effect of Phosphorus Diffusion to the Recombination at the Si-SiO2 Interface', Progress in Photovoltaics: Research and Applications, vol. 17, no. 3, pp. 177-181.

Year

2009

Field of Research

  • Electrical And Electronic Engineering Not Elsewhere Classified

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