Effect of atomic H exposure... - Researchers

Effect of atomic H exposure on thermally oxidized Si/Si02 interfaces

Citation

Zhang, C, Weber, K & Jin, H 2009, 'Effect of atomic H exposure on thermally oxidized Si/Si02 interfaces', European Photovoltaic Solar Energy Conference EUPVSEC 2009, ed. W. Sinke, H.Ossenbrink, P.Helm, WIP-Renewable Energies, Germany, pp. 570-574.

Year

2009

ANU Authors

Professor Klaus Weber
Dr Hao Jin

Field of Research

Power And Energy Systems Engineering (Excl. Renewable Power)

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