Comparison of plasma NH3 and atomic H effects to Si-SiO2 interface
Citation
Jin, H, Weber, K, Blakers, A et al 2006, 'Comparison of plasma NH3 and atomic H effects to Si-SiO2 interface', International Conference on New Energy Materials, Academic Press, not provided.Year
2006Fields of Research
- Electrical And Electronic Engineering Not Elsewhere Classified
- Materials Engineering Not Elsewhere Classified
