Si-SiO2 interface passivation by plasma NH3 and atomic H

Citation

Jin, H, Weber, K, Jayaprasad, A et al 2006, 'Si-SiO2 interface passivation by plasma NH3 and atomic H', Rare Metals, vol. 25, no. Special Issue, pp. 146-149.

Year

2006

Fields of Research

  • Electrical And Electronic Engineering Not Elsewhere Classified
  • Materials Engineering Not Elsewhere Classified

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