Si-SiO2 interface passivation by plasma NH3 and atomic H
Citation
Jin, H, Weber, K, Jayaprasad, A et al 2006, 'Si-SiO2 interface passivation by plasma NH3 and atomic H', Rare Metals, vol. 25, no. Special Issue, pp. 146-149.Year
2006Fields of Research
- Electrical And Electronic Engineering Not Elsewhere Classified
- Materials Engineering Not Elsewhere Classified
