Investigation of reactive ion etching of dielectrics and Si in CHF3/O2 or CHF3/Ar for photovoltaic applications

Citation

Gatzert, C, Blakers, A, Deenapanray, P et al 2006, 'Investigation of reactive ion etching of dielectrics and Si in CHF3/O2 or CHF3/Ar for photovoltaic applications', Journal of Vacuum Science and Technology A, vol. 24, no. 5, pp. 1857-1865.

Year

2006

Fields of Research

  • Materials Engineering Not Elsewhere Classified
  • Electrical And Electronic Engineering Not Elsewhere Classified

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