Investigation of reactive ion etching of dielectrics and Si in CHF3/O2 or CHF3/Ar for photovoltaic applications
Citation
Gatzert, C, Blakers, A, Deenapanray, P et al 2006, 'Investigation of reactive ion etching of dielectrics and Si in CHF3/O2 or CHF3/Ar for photovoltaic applications', Journal of Vacuum Science and Technology A, vol. 24, no. 5, pp. 1857-1865.Year
2006Fields of Research
- Materials Engineering Not Elsewhere Classified
- Electrical And Electronic Engineering Not Elsewhere Classified
