Fabrication of Schottky Barrier MOSFETs using Self-Assembly CoSi2 Nanopatterning and Spacer Gate Technologies

Citation

Zhao, Q, Kluth, P, Bay, H et al 2003, 'Fabrication of Schottky Barrier MOSFETs using Self-Assembly CoSi2 Nanopatterning and Spacer Gate Technologies', Microelectronic Engineering, vol. 70, pp. 186-190.

Year

2003

Field of Research

  • Renewable Power And Energy Systems Engineering (Excl. Solar Cells)

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