Fabrication of Schottky Barrier MOSFETs using Self-Assembly CoSi2 Nanopatterning and Spacer Gate Technologies
Citation
Zhao, Q, Kluth, P, Bay, H et al 2003, 'Fabrication of Schottky Barrier MOSFETs using Self-Assembly CoSi2 Nanopatterning and Spacer Gate Technologies', Microelectronic Engineering, vol. 70, pp. 186-190.Year
2003ANU Authors
Field of Research
- Renewable Power And Energy Systems Engineering (Excl. Solar Cells)