Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films

Citation

Martin, I, Vetter, M, Orpella, A et al 2001, 'Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films', Applied Physics Letters, vol. 79, no. 14, pp. 2199-2201.

Year

2001

ANU Authors

Field of Research

  • Electrical And Electronic Engineering Not Elsewhere Classified

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