Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films
Citation
Martin, I, Vetter, M, Orpella, A et al 2001, 'Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films', Applied Physics Letters, vol. 79, no. 14, pp. 2199-2201.Year
2001ANU Authors
Field of Research
- Electrical And Electronic Engineering Not Elsewhere Classified