Role of Ions in SiO2 Deposition with Pulsed and Continuous Helicon Plasmas
Citation
Charles, C 2002, 'Role of Ions in SiO2 Deposition with Pulsed and Continuous Helicon Plasmas', Pure and Applied Chemistry, vol. 74, no. 3, pp. 401-405.Year
2002ANU Authors
Field of Research
- Plasma Physics; Fusion Plasmas; Electrical Discharges