A Novel Silicon Texturization Method Based on Etching Through a Silicon Nitride Mask

Citation

Weber, K & Blakers, A 2005, 'A Novel Silicon Texturization Method Based on Etching Through a Silicon Nitride Mask', Progress in Photovoltaics: Research and Applications, vol. 13, no. 8, pp. 691-695.

Year

2005

Fields of Research

  • Electrical And Electronic Engineering Not Elsewhere Classified
  • Materials Engineering Not Elsewhere Classified

Updated:  11 August 2022 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers