Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration
Citation
Choi, D, Lee, J, Kim, D et al 2003, 'Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration', SPIE Photonics Fabrication Europe Conference 2002, ed. Giancarlo C. Righini, SPIE - The International Society for Optical Engineering, USA, pp. 337 - 345.
Year
2003
Field of Research
- Optical Physics Not Elsewhere Classified