Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration

Citation

Choi, D, Lee, J, Kim, D et al 2003, 'Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration', SPIE Photonics Fabrication Europe Conference 2002, ed. Giancarlo C. Righini, SPIE - The International Society for Optical Engineering, USA, pp. 337 - 345.

Year

2003

Field of Research

  • Optical Physics Not Elsewhere Classified

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