Effect of temperature and incident ion energy on nanostructure formation on silicon exposed to helium plasma

Citation

Thompson, M, Shi, Q, Kajita, S et al. 2020, 'Effect of temperature and incident ion energy on nanostructure formation on silicon exposed to helium plasma', Plasma Processes and Polymers, vol. 17, no. 12, pp. 1-7.

Year

2020

Field of Research

  • Surfaces And Structural Properties Of Condensed Matter

Updated:  19 April 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers