Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditions
Citation
Hadley, A, Notthoff, C, Mota Santiago, P et al. 2019, 'Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditions', Nanotechnology, vol. 30, no. 27.Year
2019ANU Authors
Field of Research
- Surfaces And Structural Properties Of Condensed Matter