Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditions

Citation

Hadley, A, Notthoff, C, Mota Santiago, P et al. 2019, 'Etched ion tracks in amorphous SiO2 characterized by small angle x-ray scattering: influence of ion energy and etching conditions', Nanotechnology, vol. 30, no. 27.

Year

2019

Field of Research

  • Surfaces And Structural Properties Of Condensed Matter

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