Effective passivation of silicon surfaces by ultrathin atomic-layer deposited niobium oxide

Citation

Macco, B, Bivour, M, Deijkers, J et al. 2018, 'Effective passivation of silicon surfaces by ultrathin atomic-layer deposited niobium oxide', Applied Physics Letters, vol. 112, pp. 1-5.

Year

2018

ANU Authors

Fields of Research

  • Photodetectors, Optical Sensors And Solar Cells
  • Elemental Semiconductors
  • Nanomaterials

Updated:  18 April 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers