Elimination and quantification of oxidation induced interstitial injection via Ge implants

Citation

Martin, T, Jones, K, Camillo-Castillo, R et al. 2017, 'Elimination and quantification of oxidation induced interstitial injection via Ge implants', Processes at the Semiconductor Solution Interface 7, PSSI 2017 - 231st ECS Meeting 2017, ed. Hillier, O'Dwyer, Lynch, Wang, Sunkara, Buckley, Etcheberry & Vereecken, The Electrochemical Society, TBC, pp. 135-143 pp.

Year

2017

ANU Authors

Field of Research

  • Materials Engineering Not Elsewhere Classified

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