Recombination and thin film properties of silicon nitride and amorphous silicon passivated c-Si following ammonia plasma exposure

Citation

Wan, Y, McIntosh, K, Thomson, A et al 2015, 'Recombination and thin film properties of silicon nitride and amorphous silicon passivated c-Si following ammonia plasma exposure', Applied Physics Letters, vol. 106, no. 4, pp. 1-4pp.

Year

2015

Fields of Research

  • Classical And Physical Optics
  • Materials Engineering Not Elsewhere Classified

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