Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers
Citation
Booker, K, Brauers, M, Crisp, E et al. 2014, 'Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers', Journal of Micromechanics and Microengineering, vol. 24, no. 12, p. 125026.Year
2014ANU Authors
Fields of Research
- Elemental Semiconductors
- Photodetectors, Optical Sensors And Solar Cells
- Microelectromechanical Systems (Mems)
