Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers

Citation

Booker, K, Brauers, M, Crisp, E et al 2014, 'Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers', Journal of Micromechanics and Microengineering, vol. 24, no. 12, p. 125026.

Year

2014

Fields of Research

  • Elemental Semiconductors
  • Microelectromechanical Systems (Mems)
  • Photodetectors, Optical Sensors And Solar Cells

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