Development of a new plasma source for next generation plasma etch processing equipment
Researchers
- Professor Christine Charles (Primary Investigator)
- Professor Roderick Boswell (Secondary Investigator)
Grant status
Completed-Pending ReportsGrant start date
01/11/2010Grant funding
- 2011: $251,621 from LAM Research Corporation
- 2012: $135,488 from LAM Research Corporation