Development of a new plasma source for next generation plasma etch processing equipment

Researchers

Grant status

Completed-Pending Reports

Grant start date

01/11/2010

Grant funding

  • 2011: $251,621 from LAM Research Corporation
  • 2012: $135,488 from LAM Research Corporation

Updated:  29 March 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers